Stoichiometry and Phase Composition of MOCVD Barium Titanate Films
Charles E. Bouldin, Joseph Woicik, Bruce Ravel, Debra Kaiser, Mark D. Vaudin
X-ray absorption fine structure (XAFS), x-ray diffraction (XRD) and x-ray fluorescence (XRF) have been used to study the stoichiometry and phase composition of thin (approximately equal to} 1 micron) films deposited on MgO substrates. Deposition temperatures were 600 degrees}C to 800 degrees}C and film growth rates were approximately equal to} 1 Angstrom/s. When the films are very Ba-rich, they form amorphous films of di-Barium Titanate, while the Ba-deficient films deposited at low temperatures form amorphous phases that are similar to Barium Titanate (BaTi03) but with BA vacancies and orientational disorder of the Ti-0 octahedra.