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Stoichiometry and Phase Composition of MOCVD Barium Titanate Films

Published

Author(s)

Charles E. Bouldin, Joseph Woicik, Bruce Ravel, Debra Kaiser, Mark D. Vaudin

Abstract

X-ray absorption fine structure (XAFS), x-ray diffraction (XRD) and x-ray fluorescence (XRF) have been used to study the stoichiometry and phase composition of thin (approximately equal to} 1 micron) films deposited on MgO substrates. Deposition temperatures were 600 degrees}C to 800 degrees}C and film growth rates were approximately equal to} 1 Angstrom/s. When the films are very Ba-rich, they form amorphous films of di-Barium Titanate, while the Ba-deficient films deposited at low temperatures form amorphous phases that are similar to Barium Titanate (BaTi03) but with BA vacancies and orientational disorder of the Ti-0 octahedra.
Citation
Journal of Materials Research

Keywords

dielectric constant, EXAFS, MOCVD, XANES

Citation

Bouldin, C. , Woicik, J. , Ravel, B. , Kaiser, D. and Vaudin, M. (2021), Stoichiometry and Phase Composition of MOCVD Barium Titanate Films, Journal of Materials Research (Accessed July 21, 2024)

Issues

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Created October 12, 2021