In-situ Stress Measurements During Cobalt Electrodeposition

Published

January 12, 2019

Author(s)

Gery R. Stafford, Ugo Bertocci

Abstract

In situ cantilever curvature is used to quantify the growth stress in Co thin films, electrodeposited from an electrolyte consisting of 0.5 mol/L Na2SO4, 0.5 mol/L H3BO3, and 0.1 mol/L CoSO4 . 7 H20. The average biaxial steady-state stress is measured as a function of the deposition potential and is examined as a function of growth rate. Stresses as low as +85 MPa (tensile) are obtained at small growth rate, increasing to a limiting value of +800 MPa as the growth rate is increase. The data is fit to a kinetic model that appears in the literature that treats the stress as a dynamic competition between coalescence-induced tensile stress and compressive stress due to insertion of atoms into the grain boundary. Kinetic parameters for Co indicate that stress development is dominated by nuclei coalescence and that ad-atom insertion into the grain boundary contributes to the overall stress only at very low growth rates.

Citation

Journal of the Electrochemical Society

Volume

166

Issue

1

Pub Type

Journals

Download Paper

https://doi.org/10.1149/2.0311901 jus

Local Download

Keywords

electrodeposition, cobalt, stress, cantilever curvature

Citation

Stafford, G. and Bertocci, U. (2019), In-situ Stress Measurements During Cobalt Electrodeposition, Journal of the Electrochemical Society, [online], https://doi.org/10.1149/2.0311901 jus (Accessed April 24, 2024)