Walker, M.
, Richter, L.
and Moffat, T.
(2008),
In-Situ Ellipsometric Study of the Competitive Adsorption of PEG-/CI-/(SPS/MPS) on Cu, ECS Transactions
(Accessed April 27, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
In-Situ Ellipsometric Study of the Competitive Adsorption of PEG-/CI-/(SPS/MPS) on Cu
Published
Author(s)
, ,
Abstract
The adsorption of Cu electrodeposition accelerating agents SPS and MPS on evaporated Cu thin films was examined in-situ using spectroscopic ellipsometry under quiescent conditions. Both the thiol (MPS) and disulfide (SPS) resulted in definitive changes in the optical response of the interface, indicative of irreversible chemisorption. The optical responses of the two additives were different, however, suggesting a difference in the adsorbed states. Upon thiol or disulfide adsorption, the inhibition of the specific adsorption of PEG in the presence of Cl- is demonstrated. Pre-adsorbed Cl-/PEG layers hinder SPS adsorption to a greater extent than MPS adsorption; however, these layers are disrupted upon the adsorption of either organosulfur additive..Citation
ECS Transactions
Pub Type
Journals
Keywords
chloride, Cl-, Cu electrodeposition, disulfide, MPS, PEG, spectroscopic ellipsometry, SPS, Thiol
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created October 16, 2008