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Silicon Nanowire Nonvolatile-Memory with Varying HfO2 Charge Trapping Layer Thickness

Published

Author(s)

Xiaoxiao Zhu, Qiliang Li, D. E. Ioannou, H Gu, Helmut Baumgart, John E. Bonevich, John S. Suehle, Curt A. Richter

Citation

Zhu, X. , Li, Q. , Ioannou, D. , Gu, H. , Baumgart, H. , Bonevich, J. , Suehle, J. and Richter, C. (2009), Silicon Nanowire Nonvolatile-Memory with Varying HfO2 Charge Trapping Layer Thickness (Accessed June 16, 2024)

Issues

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Created December 8, 2009, Updated October 12, 2021