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Displaying 26 - 30 of 30

Effect of Chloride Concentration on Copper Deposition in Through Silicon Vias

January 18, 2019
Author(s)
Trevor Braun, Daniel Josell, Manoj R. Silva, Thomas P. Moffat
This work examines Cu deposition in low chloride, suppressor containing electrolytes that exhibit a transition from passive to active deposition partway down filling features based on the coupling of suppression breakdown and surface topography. The

Superconformal Nickel Deposition in Through Silicon Vias: Experiment and Prediction

May 16, 2018
Author(s)
Trevor Braun, Daniel Josell, Thomas P. Moffat, Hyo Jong Lee, SH Kim
This work examines the filling of Through Silicon Vias (TSV) by Ni deposition from a NiSO4 + NiCl2 + H3BO3 electrolyte containing a branched polyethyleneimine suppressor previously. Feature filling occurs through the coupling of transport limited
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