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A Rapid Prototyping Technique for the Fabrication of Solvent-Resistant Structures

Published

Author(s)

C Harrison, J Cabral, Christopher M. Stafford, Alamgir Karim, Eric J. Amis

Abstract

We demonstrate a rapid prototyping technique for the fabrication of solvent-resistant channels up to and exceeding one millimeter in height. The fabrication of channels with such dimensions by conventional lithography would be both challenging and time-consuming. Furthermore, we show that this technology can be used to fabricate channels with a depth that varies linearly with distance. This technique requires only a long-wavelength ultraviolet source, a mask made by a desktop printer, and a commercially available optical adhesive. We demonstrate two lithographic methods: one which fabricates channels sealed between glass plates (closed-face) and one which fabricates structures on a single plate (open-faced). The latter is fully compatible with silicone replication techniques to make fluid handling device.
Citation
Journal of Micromechanics and Microengineering
Volume
14
Issue
No. 1

Keywords

channels, fabrication, fluidics, lithography, microfluidics, PDMS, prototyping, solvent-resistant, UV

Citation

Harrison, C. , Cabral, J. , Stafford, C. , Karim, A. and Amis, E. (2003), A Rapid Prototyping Technique for the Fabrication of Solvent-Resistant Structures, Journal of Micromechanics and Microengineering, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852199 (Accessed July 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 1, 2003, Updated February 19, 2017