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Polarization of Out-of-Plane Optical Scatter From SiO2 Films Grown on Photolithographically-Generated Microrough Silicon

Published

Author(s)

Thomas A. Germer, B W. Scheer

Abstract

Bi-directional ellipsometry results are presented for scatter from SiO2 films grown on photolithographically produced microrough silicon surfaces. The principle direction of the polarization and the degree of linear polarization for scatter directions out of the plane of incidence are compared to results of theoretical modeling for interfacial microroughness in the presence of dielectric layers. The results indicate that light scattered from these surfaces do not behave like that from two truly random rough correlated interfaces. Possible reasons for the lack of agreement between the model and the data are discussed.
Citation
SPIE series
Volume
3246

Keywords

bidirectional ellipsometry, dielectric films, microroughness, polarimetry, scatter, surfaces

Citation

Germer, T. and Scheer, B. (1998), Polarization of Out-of-Plane Optical Scatter From SiO<sub>2</sub> Films Grown on Photolithographically-Generated Microrough Silicon, SPIE series (Accessed May 24, 2024)

Issues

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Created July 1, 1998, Updated February 17, 2017