Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Oxygen Reduction Reaction (ORR) on Electrodeposited Pt_(100-x-y)Ni_(x)Pd_(y) Thin Films.

Published

Author(s)

Sun M. Hwang, Chang H. Lee, Jae Jeong Kim, Thomas P. Moffat

Abstract

The kinetics of the oxygen reduction reaction (ORR) were examined on a series of Pt_(100-x-y)Ni_(x)Pd_(y) ternary alloys. Films were produced by electrodeposition that involved a combination of underpotential and overpotential reactions. For Pt-rich Pt_(100-x-y)Ni_(x)Pd_(y) alloy films (x<0.65) Ni co-deposition occurred at underpotentials while for Ni-rich films (x>0.65) deposition proceeded at overpotentials. Rotating disk electrode (RDE) measurements of the ORR kinetics on Ni-rich Pt_(100-x-y)Ni_(x)Pd_(y) thin films revealed up to a 6.5 fold enhancement of the catalytic activity relative to Pt films with the same Pt mass loading. More than half of the electrocatalytic gain maybe attributed to surface area expansion due to Ni dealloying. Surface area normalization based on the H_(upd) charge reduced the enhancement factor to a value less than 2. The most active ternary alloy film for ORR was Pt_(25)Ni_(73)Pd_(2). Comparison of the ORR on Pt, Pt_(20)Ni_(80), Pt_(25)Ni(73)Pd_(2) thin films indicate the binary alloy is the most active with a H_(upd) normalized ORR enhancement factor of up to 3.0 compared to 1.6 for the ternary alloy.
Citation
Electrochimica ACTA

Keywords

electrodeposition, nickel, oxygen reduction reaction (ORR), palladium, Pt-based ternary alloy

Citation

Hwang, S. , Lee, C. , Kim, J. and Moffat, T. (2010), Oxygen Reduction Reaction (ORR) on Electrodeposited Pt_(100-x-y)Ni_(x)Pd_(y) Thin Films., Electrochimica ACTA (Accessed November 10, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 9, 2010, Updated October 12, 2021