Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Optimization of Focused Ion Beam-Tomography for Superconducting Electronics



Aric W. Sanders, Anna E. Fox, Paul D. Dresselhaus, Alexandra Curtin


Superconducting electronics play an important role in quantum computation, ultra-low power electronics, voltage standards and magnetic sensors. Many of these applications rely on the microfabrication of superconducting circuits with multiple wiring layers and a range of active elements. The performance of these superconducting circuits are directly related to the three dimensional microstructure of these wiring layers and active elements. Focused ion beam tomography is an ideal tool for exploring this microstructure, however the processes of milling, imaging, and reconstruction must be optimized for the information most pertinent to superconducting electronics. We present the optimization of tomographic collection and reconstruction using the NIST designed 10 V Programmable Josephson Voltage Standard (PJVS).
Proceedings Title
Microscopy and Microanyalsis
Conference Dates
August 3-8, 2014
Conference Location
Hartford, CT
Conference Title
Microscopy and Microanalysis 2014


Tomography, Microfabrication, FIB, Volt, PJVS


Sanders, A. , Fox, A. , Dresselhaus, P. and Curtin, A. (2014), Optimization of Focused Ion Beam-Tomography for Superconducting Electronics, Microscopy and Microanyalsis, Hartford, CT, [online], (Accessed June 18, 2024)


If you have any questions about this publication or are having problems accessing it, please contact

Created August 27, 2014, Updated November 10, 2018