Optimization of Focused Ion Beam-Tomography for Superconducting Electronics

Published: August 27, 2014

Author(s)

Aric W. Sanders, Anna E. Fox, Paul D. Dresselhaus, Alexandra Curtin

Abstract

Superconducting electronics play an important role in quantum computation, ultra-low power electronics, voltage standards and magnetic sensors. Many of these applications rely on the microfabrication of superconducting circuits with multiple wiring layers and a range of active elements. The performance of these superconducting circuits are directly related to the three dimensional microstructure of these wiring layers and active elements. Focused ion beam tomography is an ideal tool for exploring this microstructure, however the processes of milling, imaging, and reconstruction must be optimized for the information most pertinent to superconducting electronics. We present the optimization of tomographic collection and reconstruction using the NIST designed 10 V Programmable Josephson Voltage Standard (PJVS).
Proceedings Title: Microscopy and Microanyalsis
Volume: 20
Conference Dates: August 3-8, 2014
Conference Location: Hartford, CT
Conference Title: Microscopy and Microanalysis 2014
Pub Type: Conferences

Keywords

Tomography, Microfabrication, FIB, Volt, PJVS
Created August 27, 2014, Updated November 10, 2018