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Multilayer and functional coatings on carbon nanotubes using atomic layer deposition

Published

Author(s)

Cari F. Herrmann, F Fabreguette, Dudley Finch, Roy H. Geiss, S M. George

Abstract

Atomic layer deposition can be used to deposit ultra thin and conformal films on substrates with very high aspect ratios such as nanotubes and nanowires. In this paper, we demonstrate that functionalized and multilayered ALD coatings can be deposited conformally on carbon nanotubes. Multilayered coatings consisting of alternating layers of dielectric and conductive materials, such as AI203 and W, respectively, are deposited on conductive carbon nanotubes. This structure can function as a nanoscale coaxial cable. Additionally, thin layers of AI203 ALD can be used as a seed layer to functionalize nanotubes. For example, a carbon nanotube was made highly hydrophobic using an AI203 ALD adhesion layer followed by the attachment of perfluorinated molecules.
Citation
Physical Review Letters
Volume
87

Keywords

alumina, atomic layer deposition, carbon nanotubes, surface modification, tungsten, transmission electron microscopy

Citation

Herrmann, C. , Fabreguette, F. , Finch, D. , Geiss, R. and George, S. (2005), Multilayer and functional coatings on carbon nanotubes using atomic layer deposition, Physical Review Letters, [online], https://doi.org/10.1063/1.2053358 (Accessed May 27, 2024)

Issues

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Created September 13, 2005, Updated October 12, 2021