Mulholland, G.
, Germer, T.
and Stover, J.
(2017),
Modeling, Measurement, and Standards for Wafer Inspection, GOMACTech Conference
(Accessed March 31, 2026)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Modeling, Measurement, and Standards for Wafer Inspection
Published
Author(s)
, , J C. Stover
Abstract
The major technical issues regarding the calibration of Surface Scanning Inspection Systems (SSIS) are presented including descriptions of the salient features of SSISs and the deposition system using the differential mobility analyzer. The role of the NIST SRM 1963 (100 nm) as a calibration standard is discussed. Data from round robin experiments, which NIST has helped the SEMI SSIS Task Force run, are reviewed. The major features of the new standards is presented. In addition, recent advances made at The Scatter Works and NIST in regard to accurate particle sizing by light scattering are described.Citation
GOMACTech Conference
Pub Type
Journals
Keywords
BRDF for 100 nm PSL spheres, differential mobility analyzer, NIST SRM 1963, SEMI standard for particle deposition, SSIS
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created February 19, 2017