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Modeling, Measurement, and Standards for Wafer Inspection

Published

Author(s)

George Mulholland, Thomas A. Germer, J C. Stover

Abstract

The major technical issues regarding the calibration of Surface Scanning Inspection Systems (SSIS) are presented including descriptions of the salient features of SSISs and the deposition system using the differential mobility analyzer. The role of the NIST SRM 1963 (100 nm) as a calibration standard is discussed. Data from round robin experiments, which NIST has helped the SEMI SSIS Task Force run, are reviewed. The major features of the new standards is presented. In addition, recent advances made at The Scatter Works and NIST in regard to accurate particle sizing by light scattering are described.
Citation
GOMACTech Conference

Keywords

BRDF for 100 nm PSL spheres, differential mobility analyzer, NIST SRM 1963, SEMI standard for particle deposition, SSIS

Citation

Mulholland, G. , Germer, T. and Stover, J. (2017), Modeling, Measurement, and Standards for Wafer Inspection, GOMACTech Conference (Accessed May 26, 2024)

Issues

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Created February 19, 2017