Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Microstructural Development and Thermal Diffusivity of Al2O3 Thin Films Prepared by a Continuous-Dip Coating Process

Published

Author(s)

E J. Gonzalez, B Hockey, Joseph J. Ritter

Abstract

Films of -Al2O3, 4:m to 6:m thick, have been coated onto inconel using the continuous-dip coating technique. The as-deposited films on an Inconel 600 substrate are amorphous and exhibit a thermal diffusivity of (0.0033 0.0004) cm2@s-1, a value comparable to that of window glass. The films can be crystallized by heat-treating at 800 EC to 1000 EC for 3 h under flowing dry nitrogen gas. The thermal diffusivity of the crystalline films increased with annealing temperature. However, heat-treatment also resulted in large-scale porosity and cracks within the films which limited their thermal diffusivity to (0.0219 0.0022) cm2@s-1.
Citation
Journal of Materials Research

Keywords

Al2O3, continuous-dip coating process, microstructure, photothermal deflection technique, Thermal Diffusivity, thin film

Citation

Gonzalez, E. , Hockey, B. and Ritter, J. (2021), Microstructural Development and Thermal Diffusivity of Al<sub>2</sub>O<sub>3</sub> Thin Films Prepared by a Continuous-Dip Coating Process, Journal of Materials Research (Accessed December 3, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 12, 2021