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Microstructural Development and Thermal Diffusivity of Al2O3 Thin Films Prepared by a Continuous-Dip Coating Process

Published

Author(s)

E J. Gonzalez, B Hockey, Joseph J. Ritter

Abstract

Films of -Al2O3, 4:m to 6:m thick, have been coated onto inconel using the continuous-dip coating technique. The as-deposited films on an Inconel 600 substrate are amorphous and exhibit a thermal diffusivity of (0.0033 0.0004) cm2@s-1, a value comparable to that of window glass. The films can be crystallized by heat-treating at 800 EC to 1000 EC for 3 h under flowing dry nitrogen gas. The thermal diffusivity of the crystalline films increased with annealing temperature. However, heat-treatment also resulted in large-scale porosity and cracks within the films which limited their thermal diffusivity to (0.0219 0.0022) cm2@s-1.
Citation
Journal of Materials Research

Keywords

Al2O3, continuous-dip coating process, microstructure, photothermal deflection technique, Thermal Diffusivity, thin film

Citation

Gonzalez, E. , Hockey, B. and Ritter, J. (2021), Microstructural Development and Thermal Diffusivity of Al<sub>2</sub>O<sub>3</sub> Thin Films Prepared by a Continuous-Dip Coating Process, Journal of Materials Research (Accessed October 19, 2021)
Created October 12, 2021