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Metrology at the Nanoscale: What are the Grand Challenges?

Published

Author(s)

Kevin W. Lyons, Michael T. Postek

Abstract

Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet the needs of the emerging integrated manufacturing community it is important that research on scale-up of nanotechnology for high rate production, reliability, robustness, yield, efficiency and cost issues for manufactured products and services be pursued. To achieve this, new research directions must include a systems approach that encompasses the characterization of instrumentation, three dimensional metrology, and production hardened metrology. To illustrate the value of metrology and the role of standards to facilitate product realization a number of National Nanotechnology Initiative (NNI) sponsored workshops have been organized. This paper provides an overview of some key findings and recommendations identified at two nanomanufacturing workshops held in 2004 and 2006 that were focused on metrology, instrumentation, and standards.
Proceedings Title
SPIE NanoScience and Engineering
Conference Dates
August 10-14, 2008
Conference Location
San Diego, CA

Keywords

Nanomanufacturing, Integration, Instrumentation, Interoperability, Standards, Nanometrology, Information Technologies, IT, Information Management

Citation

Lyons, K. and Postek, M. (2008), Metrology at the Nanoscale: What are the Grand Challenges?, SPIE NanoScience and Engineering, San Diego, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=824701 (Accessed May 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 6, 2008, Updated February 19, 2017