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Measurement of Patterned Film Linewidth for Interconnect Characterization

Published

Author(s)

Loren W. Linholm, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore, Santos D. Mayo, Harry A. Schafft, John A. Kramar, E C. Teague
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Volume
8
Conference Dates
March 22-25, 1995
Conference Location
Nara, 1, JA

Citation

Linholm, L. , Allen, R. , Cresswell, M. , Ghoshtagore, R. , Mayo, S. , Schafft, H. , Kramar, J. and Teague, E. (1995), Measurement of Patterned Film Linewidth for Interconnect Characterization, Proc., IEEE International Conference on Microelectronic Test Structures, Nara, 1, JA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=16737 (Accessed April 18, 2024)
Created December 30, 1995, Updated October 12, 2021