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PUBLICATIONS

Measurement of Patterned Film Linewidth for Interconnect Characterization

Published

Author(s)

Loren W. Linholm, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore, Santos D. Mayo, Harry A. Schafft, John A. Kramar, E C. Teague
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Volume
8
Conference Dates
March 22-25, 1995
Conference Location
Nara, 1, JA
Pub Type
Conferences

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Local Download

Citation

Linholm, L. , Allen, R. , Cresswell, M. , Ghoshtagore, R. , Mayo, S. , Schafft, H. , Kramar, J. and Teague, E. (1995), Measurement of Patterned Film Linewidth for Interconnect Characterization, Proc., IEEE International Conference on Microelectronic Test Structures, Nara, 1, JA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=16737 (Accessed December 13, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1995, Updated October 12, 2021