Shima, M.
, Salamanca-Riba, L.
, Moffat, T.
and McMichael, R.
(2002),
Magnetic Properties of Ultrathin Laminated Co/Cu Films Prepared by Electrodeposition, Journal of the Electrochemical Society
(Accessed April 28, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Magnetic Properties of Ultrathin Laminated Co/Cu Films Prepared by Electrodeposition
Published
Author(s)
, L Salamanca-Riba, ,
Abstract
The magnetic properties of a series of electrodeposited [Co(x ML)/Cu(17 ML)]100 multilayers have been examined as a function of the cobalt layer thickness. The multilayers were grown on Si(100)covered with a highly textured Cu(100) seed alyer. Films with a cobalt layer thickness less than x 1.7 ML the lateral length scale becomes large enough to stabilize ferromagnetism and the giant magnetoresistance effect is observed. The influence of magneticrystalline anisotropy is not apparent until 2.5 > x > 3.7 ML. The coercivity increases between 1.6 and 9 ML reflecting the combined influence of the magnetocrystalline anisotropy and surface roughness.Citation
Journal of the Electrochemical Society
Volume
149
Issue
No. 9
Pub Type
Journals
Keywords
Co/Cu multilayers, elecrodeposition, ferromagnetic, magnetoresistance, x-ray diffraction
Citation
Created September 1, 2002, Updated February 17, 2017