Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Magnetic Depth Profiling Co/Cu Multilayers to Investigate Magnetoresistance



John Unguris, D Tulchinsky, Michael H. Kelley, Julie A. Borchers, Joseph A. Dura, Charles F. Majkrzak, S. Y. Hsu, R Loloee, W Pratt, J Bass


The magnetic microstructure responsible for the metastable high resistance state of weakly coupled, as-prepared [Co(6nm)/Cu(6nm)]20 multilayer was analyzed using polarized neutron reflectivity (PNR) and scanning electron microscopy with polarization analysis (SEMPA). This paper focuses and expands on the SEMPA measurements. In multilayer structures such as these, SEMPA can be combined with ion milling to directly image the layer-by-layer magnetization and quantitatively depth profile the interlayer magnetic domain correlations. We found that in the as-prepared Co/Cu multilayer the domains are about one micrometer in size and the magnetizations in adjacent layers are almost completly oppositely aligned. The relative magnetoresitance derived from this measured degree of anticorrelation is in agreement with the measured magnetoresistance.
Journal of Applied Physics


Co, Cu, domain correlation, GMR, magnetoresistance, multilayers, neutron, SEMPA


Unguris, J. , Tulchinsky, D. , Kelley, M. , Borchers, J. , Dura, J. , Majkrzak, C. , Hsu, S. , Loloee, R. , Pratt, W. and Bass, J. (2000), Magnetic Depth Profiling Co/Cu Multilayers to Investigate Magnetoresistance, Journal of Applied Physics, [online], (Accessed April 25, 2024)
Created May 1, 2000, Updated February 19, 2017