Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Low Jitter Metal Vapor Vacuum Arc Ion Source for EBIT Injections

Published

Author(s)

G Holland, Craig N. Boyer, J Seely, Joseph N. Tan, Joshua M. Pomeroy, John D. Gillaspy

Abstract

A metal vapor vacuum arc (MeVVA) ion source having eight different cathodes that are individually selectable via the control electronics and having low trigger jitter (200 ns) is described. The arc plasma is produced by means of a 26 kV, 125 A, 30 s pulse delivering 2.4 mC of charge to the cathode sample material that resides inside the vacuum head assembly. The over-damped pulse produces an ion flux of 8.4x109 ions/cm2, during a single discharge measured by an unbiased Faraday cup positioned 20 cm from the extractor grid, at discharge cadences up to 5 Hz. The electronic triggering of the discharge was via a fiber optic interface. The design, fabrication, and performance of this MeVVA, recently installed at the National Institute of Standards and Technology (NIST) Electron Beam Ion Trap (EBIT), are presented.
Citation
Review of Scientific Instruments
Volume
76
Issue
6

Keywords

anode, cathode, Electron Beam Ion Trap (EBIT), highly charged ions, ion source, metal vapor vacuum arc (MeVVA)

Citation

Holland, G. , Boyer, C. , Seely, J. , Tan, J. , Pomeroy, J. and Gillaspy, J. (2005), Low Jitter Metal Vapor Vacuum Arc Ion Source for EBIT Injections, Review of Scientific Instruments (Accessed May 30, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created June 26, 2005, Updated October 12, 2021