Kinetics of Photodegradation and Nanoparticle Surface Accumulation of a Nanosilica/Epoxy Coating Exposed to UV Light

Published: April 12, 2016


Li Piin Sung, Justin M. Gorham, Deborah S. Jacobs, Savelas A. Rabb, Lee L. Yu, Tinh Nguyen


Temperature effect on the kinetics of photodegradation, surface accumulation of nanoparticles, and nanoparticle release in an epoxy nanocoating exposed to ultraviolet light (UV) was investigated. A model epoxy coating containing 5 % untreated nanosilica was selected. Exposed film specimens were removed at specified UV dose intervals for measurements of chemical degradation of the epoxy component, nanosilica accumulation on specimen surface, and nanosilica release as a function of UV dose for four temperatures. The chemical degradation was measured using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and UV-visible spectroscopy (UV-Vis). Atomic force microscopy (AFM) was employed to determine the kinetics of nanosilica accumulation on the nanocoating surface during UV exposure. The temperature dependence behaviors of kinetic parameters obtained by various measurement techniques will be used to better understand the degradation mechanism and surface accumulation of nanoparticles in exterior nanocoatings.
Conference Dates: April 11-13, 2016
Conference Location: Indianapolis, IN
Conference Title: Proceeding of American Coatings CONFERENCE
Pub Type: Conferences


AFM, FTIR, Nanosilica, nanoparticle release, urface morphology, UV exposure, X-ray photoelectron spectroscopy
Created April 12, 2016, Updated February 19, 2017