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PUBLICATIONS

Intrinsic Birefringence in Crystalline Optical Materials: A New Concern for Lithography

Published

Author(s)

John H. Burnett, Zachary H. Levine, Eric L. Shirley

Abstract

Crystalline optical materials, such as CaF2, expected to be used in193nm and 157nm lithography systems, turn out to have large, intrinsicbirefringences which must be carefully accounted for in the lithographyoptics design.We recently reported intrinsic birefringences in CaF2 and BaF2 thatresult in substantial directional and polarization dependences to theindices of refraction. The magnitudes of the effect in these materials aresignificantly larger than the birefringence specification for 157nmlithography, and put significant optical design constraints on 157nmsystems. Our model for the effect completely describes itscharacteristics, including the angle dependence in the crystal. Approachesto ameliorating the birefringence have been analyzed and are expected towork, though complicating the designs.
Citation
Future Fab International
Volume
12
Pub Type
Journals

Keywords

157nm Lithography, BaF2, barium fluoride, birefringence, CaF2, calcium fluoride

Citation

Burnett, J. , Levine, Z. and Shirley, E. (2002), Intrinsic Birefringence in Crystalline Optical Materials: A New Concern for Lithography, Future Fab International (Accessed April 23, 2024)

Created February 1, 2002, Updated February 17, 2017