Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Interconnect Failure Due to Cyclic Loading

Published

Author(s)

R R. Keller, Reiner Monig, Cynthia A. Volkert, E Arzt, R Schwaiger, O Kraft

Abstract

The damage generated by AC currents at 100 Hz in interconnects has been studied andcompared with mechanical fatigue damage in thin films. The nature of the damage under the twoloading conditions is qualitatively similar, supporting the idea that the AC current damage comes from mechanical cycling due to temperature swings on the order of 100 K from Joule heating in the interconnects. In both cases, the damage forms as surface wrinkles within single grains grow in amplitude and extent with time. The possible threat to the reliability of microelectronic and micro-electromechanical systems is further escalated by the observation that soft encapsulation layers do nothing to retard the formation of the damage.
Citation
International Workshop on Stress-Induced Phenomena in Metallizations

Keywords

cyclic deformation, electromigration, fatigue, interconnect reliability, thin film fatigue

Citation

Keller, R. , Monig, R. , Volkert, C. , Arzt, E. , Schwaiger, R. and Kraft, O. (2008), Interconnect Failure Due to Cyclic Loading, International Workshop on Stress-Induced Phenomena in Metallizations (Accessed April 21, 2024)
Created October 16, 2008