Kim, J.
, Ehrman, S.
and Germer, T.
(2004),
Influence of Particle Oxide Coating on Light Scattering by Submicron Metal Particles on Silicon Wafers, Applied Physics Letters
(Accessed April 21, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Influence of Particle Oxide Coating on Light Scattering by Submicron Metal Particles on Silicon Wafers
Published
Author(s)
, S H. Ehrman,
Abstract
We report the effect that room temperature oxidation has on the scattering of 633 nm light by copper particles deposited on a silicon wafer. The results provide a validation for a theory of light scattering by coated particles on a substrate and establish the lifetime of these particles as light scattering standards to be on the order of a few months. The results also suggest that the room temperature oxidation of copper particles proceeds in a continuous manner, rather than approaching an asymptotic thickness as found by Cabrera and Mott [Rep. Prog. Phys. 12, 163 (1948)] on copper films.Citation
Applied Physics Letters
Volume
84
Issue
No 8
Pub Type
Journals
Keywords
copper, oxidation, particles, scattering, surfaces
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 31, 2004, Updated October 12, 2021