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Influence of a Catalytic Surfactant on Roughness Evolution During Film Growth
Published
Author(s)
Daniel Wheeler, Thomas P. Moffat, Geoffrey B. McFadden, Sam R. Coriell, Daniel Josell
Abstract
celerator Coverage (CEAC) based mechanism for the impact of additives on the evolution of surface roughness is explained; the CEAC mechanism accounts for the conservation of locl coverage of adsorbed catalyst on a deforming interface. It has recently been demonstrated that the CEAC mechanism stabilizes surfaces against the growth of instabilities when the coverage of an adsorbed catalyst is in a steady state governed by catalyst consumption balancd by accumulation from the ambient. Surfaces with global conservation of catalyst during deposition, i.e., experiencing neither accumulation nor consumption, are not predicted to be stable. Experimental evidence suggests otherwise. This paper uses numerical analysis to demonstrate that such surfaces, while not stricly stable to arbitrarily small perturbations, are effectively stabilized through the formation of steady-state oscillatory instabilities with extremely small amplitudes. A simple front tracking algorithm is used to model the evolution of the interface.
Wheeler, D.
, Moffat, T.
, McFadden, G.
, Coriell, S.
and Josell, D.
(2003),
Influence of a Catalytic Surfactant on Roughness Evolution During Film Growth, Journal of the Electrochemical Society, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853294
(Accessed October 12, 2025)