Marx, E.
(2007),
Images of Strips On and Trenches In Substrates, Applied Optics
(Accessed May 9, 2025)
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Images of Strips On and Trenches In Substrates
Published
Author(s)
Abstract
The computation of images of lines or strips on a substrate and trenches in a substrate or a layer above a substrate, all made of dielectric or absorbing materials, using integral equations equivalent to Maxwell's equations and using Fourier optics are explained in some detail. Examples of computed images illustrating some of the features found in the images are provided. Approximations involved in the model of the actual scatterer and microscope as well as the theoretical and numerical representations are discussed.Citation
Applied Optics
Volume
46
Pub Type
Journals
Keywords
electromagnetic scattering, overlay, photomask, singular integral equations, two-dimensional Maxwell equations
Citation
Issues
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Created January 1, 2007, Updated June 2, 2021