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Growth and Decomposition of Pt Surface Oxides

Published

Author(s)

Feng Yi, Shane Arlington, Justin Gorham, William Alexander Osborn, Slavomir Nemsak, Ethan Crumlin, David A. LaVan

Abstract

The formation and thermal stability of Pt surface oxides on Pt thin film were studied in situ using ambient pressure x-ray photoelectron spectroscopy (AP-XPS). AP-XPS allows us to monitor the chemical states of both adsorbed reactants and underlying material surfaces under near atmosphere pressure. The surface Pt oxide was gradually formed, evidenced by the O 1s peak at 529.5 eV as the Pt film was heated in oxygen (550 mTorr). The Pt oxide peak reached its maximum between 217 °C and 317 °C, then decreased as the sample temperature was further increased. During cooling to room temperature from 480 °C, the Pt oxide peak first increased then decreased. The remaining Pt surface oxides partially decomposed during pumping to ultra-high vacuum and completely decomposed during heating the sample in vacuum. These results have important implications for the understanding of the surface state of platinum films in different environments and the potential catalytic mechanisms of platinum.
Citation
The Journal of Physical Chemistry Letters
Volume
13
Issue
26

Keywords

Pt, surface oxide, XPS

Citation

Yi, F. , Arlington, S. , Gorham, J. , Osborn, W. , Nemsak, S. , Crumlin, E. and LaVan, D. (2022), Growth and Decomposition of Pt Surface Oxides, The Journal of Physical Chemistry Letters, [online], https://doi.org/10.1021/acs.jpclett.2c00343, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=933063 (Accessed June 23, 2024)

Issues

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Created June 28, 2022, Updated November 29, 2022