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GaN Nanowires Grown by Molecular Beam Epitaxy

Published

Author(s)

Kristine A. Bertness, Norman A. Sanford, Albert Davydov

Abstract

The unique properties of GaN nanowires grown by molecular beam epitaxy are reviewed. These properties include the absence of residual strain, exclusion of most extended defects, long photoluminescence lifetime, low surface recombination velocity,and high mechanical quality factor. The high purity of the nanowires grown by this method allows for controllable ntype doping. P-type doping presents more challenges but has been demonstrated in active light-emitting diode devices. The present understanding of nucleation and growth of these materials is also reviewed.
Citation
IEEE Journal of Selected Topics in Quantum Electronics
Volume
17
Issue
4

Keywords

Crystal growth, nanotechnology, photoluminescence, semiconductor materials
Created August 1, 2011, Updated February 19, 2017