A Factory-Wide EDA Data Quality Performance Simulation for APC Capabilities Analysis
Xiao Zhu, Dhananjay Anand, Sulaiman Hussain, Ya-Shian Li-Baboud, James Moyne
Realizing benefits from real-time process control requires in-situ monitoring of process environment, equipment, and the wafer to maximize opportunities for process improvement and minimizing effects of process deviations. The data gathered from the multiple data source streams must be rapidly transmitted, consolidated and processed by the APC system in order to realize real-time control of processing parameters necessary for ensuring high precision manufacturing for optimal yield. To ensure accurate data fusion the data must be synchronized so that, at minimum, ordering of information is preserved at remote nodes analyzing the information.To understand the factors impacting data collection synchronization and performance, the National Institute of Standards and Technology and the University of Michigan have developed a configurable fab-wide EDA system simulator. This presentation will provide the design and implementation of the simulation framework, analysis of the results on potential limitations of factory data acquisition, and recommendations on methods to ensure improved data collection performance and other aspects of data quality.
, Anand, D.
, Hussain, S.
, Li-Baboud, Y.
and Moyne, J.
A Factory-Wide EDA Data Quality Performance Simulation for APC Capabilities Analysis, AEC/APC Symposium XX, Salt Lake City, UT, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=33161
(Accessed February 21, 2024)