Evaluation of the Interactions of a Silane Agent With Dental Monomers by Near Infrared Spectroscopy

Published

August 1, 2002

Author(s)

Sabine H. Dickens, Joseph M. Antonucci, Bruce O. Fowler

Abstract

This study evaluated the applicability of near-infrared (NIR) spectroscopy to follow the reactions of 3-methacryloxypropyltrimethoxysilane (MPTMS) with water and between MPTMS and non-hydroxylated dental monomers, e.g., ethoxylated bisphenol A dimethacrylate (EBPADMA) and urethane dimethacrylate (UDMA). The photo-polymerization kinetics of the reaction products were followed by real time NIR spectroscopy. For comparison, the reactions of MPTMS with water forming oligomeric silsesquioxane (OMPTMS), and MPTMS with Bis-GMA or a Bis-GMA/TEGDMA mixture were studied under similar conditions. Neat UDMA monomer has the highest reactivity, followed by the OMPTMS-free Bis-GMA/TEGDMA resin. The comonomer mixtures prepared from MPTMS oligomerized in UDMA or Bis-GMA/TEGDMA showed lower, but still reasonably high reactivities.The somewhat lower conversion of the OMPTMS containing monomer mixtures are, however, of lesser concern, because of the potential advantage of the high-molecular weight oligomers, which may increase the toughness of the resin based dental products, while reducing the polymerization shrinkage and shrinkage related stresses.

Proceedings Title

American Chemical Society; Division of Polymer Chemistry, National Meeting | 224th | | American Chemical Society (ACS)

Volume

43

Issue

No. 2

Conference Dates

August 1, 2002

Conference Title

Polymer Preprints

Pub Type

Conferences

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Keywords

near infrared spectroscopy, objomeric dental monomers, photopolymerization, real time photopolymerization kenetics, silsesquioxane

Citation

Dickens, S. , Antonucci, J. and Fowler, B. (2002), Evaluation of the Interactions of a Silane Agent With Dental Monomers by Near Infrared Spectroscopy, American Chemical Society; Division of Polymer Chemistry, National Meeting | 224th | | American Chemical Society (ACS), [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852029 (Accessed October 14, 2025)