Epitaxial Graphene for High-Current QHE Resistance Standards

Published: July 09, 2018


Mattias Kruskopf, Jiuning Hu, Bi Y. Wu, Yanfei Yang, Hsin Y. Lee, Albert F. Rigosi, David B. Newell, Randolph E. Elmquist


We report the growth of large-area monolayer graphene on the centimeter scale using an optimized growth process allowing for reproducibility and morphology improvements. Magneto-transport measurements on graphene quantum Hall effect devices demonstrate the applicability for high-current quantum resistance metrology.
Proceedings Title: CPEM 2018 Conference Digest
Conference Dates: July 8-13, 2018
Conference Location: Paris, -1
Conference Title: CPEM 2018
Pub Type: Conferences


epitaxial graphene, face-to-graphite (FTG), polymer-assisted growth (PASG), quantum resistance metrology
Created July 09, 2018, Updated July 17, 2018