Etzel, S.
, Rose, A.
and Wang, E.
(2000),
Dispersion of the Temperature Dependence of the Retardance in SiO<sub>2</sub> and MgF<sub>2</sub>, Applied Optics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=29995
(Accessed July 26, 2024)
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Dispersion of the Temperature Dependence of the Retardance in SiO2 and MgF2
Published
Author(s)
, Allen Rose, E. Wang
Abstract
We have directly measured the retardance versus temperature for single-crystal quartz (SiO2) and magnesium fluoride (MgF2) at wavelengths of 633, 788, 1318, and 1539 nm and over a temperature range of 24-80 0C. To our knowledge, the temperature dependence of retardance for these two materials has not been directly measured. We compared our direct measurements of the normalized temperature derivative of the retardance γ with derived values from previously reported indirect measurements and found our results to be in agreement and our measurement uncertainties to be typically a factor of 4 smaller. Our overall mean value for γsiO2 is -1.23 x 1004 with a combined standard uncertainty of 0.02 x 1004 and little wavelength dependence over the 633-1539-nm range. Our overall mean value for γMgF2 is - 5.37 x 10-5 with a combined standard uncertainty of 0.17 x 10-5 and with a small wavelength dependence over the 633-1539 nm range.Citation
Applied Optics
Volume
39
Issue
31
Pub Type
Journals
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Keywords
crystal quartz, magnesium fluoride, retardance, temperature dependence, waveplates
Citation
Issues
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Created October 31, 2000, Updated October 12, 2021