Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Dispersion of the Temperature Dependence of the Retardance in SiO2 and MgF2

Published

Author(s)

Shelley M. Etzel, Allen Rose, E. Wang

Abstract

We have directly measured the retardance versus temperature for single-crystal quartz (SiO2) and magnesium fluoride (MgF2) at wavelengths of 633, 788, 1318, and 1539 nm and over a temperature range of 24-80 0C. To our knowledge, the temperature dependence of retardance for these two materials has not been directly measured. We compared our direct measurements of the normalized temperature derivative of the retardance γ with derived values from previously reported indirect measurements and found our results to be in agreement and our measurement uncertainties to be typically a factor of 4 smaller. Our overall mean value for γsiO2 is -1.23 x 1004 with a combined standard uncertainty of 0.02 x 1004 and little wavelength dependence over the 633-1539-nm range. Our overall mean value for γMgF2 is - 5.37 x 10-5 with a combined standard uncertainty of 0.17 x 10-5 and with a small wavelength dependence over the 633-1539 nm range.
Citation
Applied Optics
Volume
39
Issue
31

Keywords

crystal quartz, magnesium fluoride, retardance, temperature dependence, waveplates

Citation

Etzel, S. , Rose, A. and Wang, E. (2000), Dispersion of the Temperature Dependence of the Retardance in SiO<sub>2</sub> and MgF<sub>2</sub>, Applied Optics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=29995 (Accessed May 29, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 31, 2000, Updated October 12, 2021