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Diffusion in the Ti-Al-V system

Published

Author(s)

Greta Lindwall, Kil-Won Moon, Zhangqi Chen, Michael J. Mengason, Maureen E. Williams, Justin M. Gorham, Ji-Cheng Zhao, Carelyn E. Campbell

Abstract

Diffusion in the Ti-Al-V system is studied and a CΑLPHAD diffusion mobility description is developed. Diffusion couple experiments are used to obtain information of Al and V diffusion in the α phase. This includes diffusion paths at the temperatures 923 K, 1023 K and 1123 K. It can be concluded that the diffusion coefficient of V in the α-Ti phase decreases with increasing Al alloying. The forward-simulation method is used to evaluate the impurity diffusion coefficient for Al and V diffusion in the α Ti-V and the Ti-Al systems which are used as input in the mobility modeling. The composition dependency for the diffusion in the α-phase in the ternary system is accounted for and a CALPHAD diffusion mobility description is obtained by directly optimizing the mobility parameters as a function of the experimental composition profiles from the diffusion couples. Literature data in terms of experimental data and previous diffusion mobility descriptions for diffusion in the β Ti-Al-V are adopted for the diffusion in the β-phase. A complete description of diffusion in α and β phases for the Ti-Al-V system is presented with the aim to be used for design of Ti alloys and processes.
Citation
Journal of Phase Equilibria and Diffusion
Volume
39

Keywords

Diffusion couple, diffusion mobility, forward-simulation method, CALPHAD, Ti alloys
Created August 23, 2018, Updated March 28, 2019