Development of B-Doped Si Multiple Δ-Layer Reference Materials for SIMS Profiling

Published

October 1, 2005

Author(s)

K J. Kim, D Moon, P Chi, David S. Simons

Abstract

B-doped Si multiple delta-layers (MDL) were developed as certified reference materials (CRM) for secondary ion mass spectrometry (SIMS) depth profiling analysis. Two CRMs with different delta-layer spacing were grown by ion beam sputter deposition. The nominal spacing of the MDL for shallow junction analysis is 10 nm and that for high energy SIMS is 50 nm. The total thickness of the film was certified by high resolution transmission electron microscopy. The B-doped Si MDLs can be used to evaluate SIMS depth resolution and to calibrate the depth scale. A consistency check of the calibration of stylus profilometers for measurement of sputter depth is another possible application. The crater depths measured by a stylus profilometer showed a good linear relationship with the thickness measured from SIMS profiling using the calibrated film thickness for depth scale calibration. The sputtering rate of the amorphous Si thin film grown by sputter deposition was found to be the same as that of the crystalline Si substrate, which means that the sputtering rate measured with these CRMs can be applied to a real analysis of crystalline Si.

Citation

Surface and Interface Analysis

Volume

37

Issue

No. 10

Pub Type

Journals

Keywords

boron, certified reference material, depth scale calibration, multiple delta layer, silicon, SIMS, stylus profilometer, TEM

Citation

Kim, K. , Moon, D. , Chi, P. and Simons, D. (2005), Development of B-Doped Si Multiple Δ-Layer Reference Materials for SIMS Profiling, Surface and Interface Analysis (Accessed May 16, 2024)