Determining the Planar Nernst Effect From Magnetic Field Dependent Thermopower and Resistance in Nickel and Permalloy Thin Films

Published

November 8, 2012

Author(s)

Azure Avery, Matthew Pufall, Barry L. Zink

Abstract

We present magnetic eld dependent measurements of thermopower, α(H), and resistance, R(H), for Ni₈₀Fe₂₀ and Ni thin films. We conducted these experiments in fields oriented parallel and perpendicular to the applied thermal gradient, gradient}T, for α(H) and applied current for R(H). We deposited the 20 nm thick lms on 500 nm thick suspended Si-N thermal isolation platforms that enable in-plane measurements of thermal and electrical properties of thin films. Both α(H) and R(H) in Ni-Fe and Ni films exhibit evidence of spin-dependent scattering through an even field dependence and a linear proportionality between α(H) and 1/R(H). Finally, we use αH_parellel} and αH_{perpendicular} to determine the planar Nernst coefficient in Ni-Fe and Ni thin films, and use this coefficient to predict the size of the planar Nernst effect (PNE) in the micromachined platform. The measured field dependence of the PNE is well matched by the prediction obtained from our α(H) results.

Citation

Physical Review B

Volume

86

Issue

18

Pub Type

Journals

Download Paper

DOI Link

Keywords

thermopower, magnetothermopower, thin films, magnetism

Citation

Avery, A. , Pufall, M. and Zink, B. (2012), Determining the Planar Nernst Effect From Magnetic Field Dependent Thermopower and Resistance in Nickel and Permalloy Thin Films, Physical Review B, [online], https://doi.org/10.1103/PhysRevB.86.184408 (Accessed April 18, 2024)