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Control of thermal expansion in a low-density framework modification of silicon

Published

Author(s)

Beekman Mathew, James A. Kaduk, Winnie K. Wong-Ng, George S. Nolas

Abstract

The low-density clathrate-II modification of silicon, Si136, contains two distinct cage-like voids large enough to accommodate various types of guest atoms which influence both the host structure and its properties. Although the linear coefficient of thermal expansion of Si136 (293 K
Citation
Applied Physics Letters
Volume
112

Keywords

Type-II clathrate, thermal expansion, Grüneisen parameter, NaxSi136 (x = 1.1, 5.5, 12.6, 17.3, and 21.9)
Created September 30, 2018, Updated March 25, 2019