Compositional Control in Electrodeposited CoxPt-x Films.

Published

August 1, 2005

Author(s)

J Mallett, Erik B. Svedberg, S Sayan, Alexander J. Shapiro, L Wielunski, T. E. Madey, P J. Chen, William F. Egelhoff Jr., Thomas P. Moffat

Abstract

Electrochemical co-deposition of Co(subscript x)Pt(subscript 1-x) alloys is demonstrated at potentials positive to that required to deposit elemental cobalt (underpotential co-deposition). Co-deposition is atributed to the negative enthalpy of Co(subscript x)Pt(subscript 1-x) alloy formation. A regular solid-solution model is used to describe the dependence of the film composition on the deposition potential. X-ray diffraction of films grown on Cu(100)(2 parallel barsSi(100), as well as poly-Au(2 parallel bars)SiO(subscript 2)(parallel bars)Si, reveal the formation of a randomly-oriented Co(subscript x)Pt(subscript 1-x)fcc alloy for x > 0.3. A transition to the hcp phase is evident at higher cobalt concentrations (x > 0.9).

Citation

Electrochemical and Solid State Letters

Volume

8

Issue

No. 1

Pub Type

Journals

Keywords

co-deposition, electrochemical

Citation

Mallett, J. , Svedberg, E. , Sayan, S. , Shapiro, A. , Wielunski, L. , Madey, T. , Chen, P. , Egelhoff, W. and Moffat, T. (2005), Compositional Control in Electrodeposited Co_xPt_-x Films., Electrochemical and Solid State Letters (Accessed October 22, 2025)