Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

The Chemical Composition of Low Dielectric Constant Films From Novel Ion Scattering Methodologies

Published

Author(s)

Christopher Soles, R J. Composto, H Wang

Abstract

A novel ion beam scattering methodology is described for determining the chemical composition of thin, Si-based low dielectric constant (k) films that typically also contain light elements like O, C, and H. Traditional elastic Rutherford backscattering spectrometry (RBS) and/or nuclear resonance enhanced RBS are not well-suited for discerning the C and O compositions in materials that also contain heavy elements like Si. To circumvent this we describe a 2 MeV forward scattering (FS) spectrometry method that greatly enhances the light element sensitivity to determine the Si:O:C ratio. Complimentary forward recoil spectrometry (FRES) experiments are used to determine the H abundance.The relative H content from the FRES spectrum of a low-k film is converted to an absolute aerial H density by comparison with a polystyrene (PS) reference film of known H content and thickness. Once the absolute aerial H density of the low-k film is known, constraints on the film thickness and the total aerial atomic density allow us extract the complete atomic composition of the low-k film from traditional backscattering spectrometry methods.
Citation
Journal of Applied Physics

Keywords

chemical composition, forward recoil spectrometry, forward scattering ion scattering, low-dielectric films rutherford backscat

Citation

Soles, C. , Composto, R. and Wang, H. (2008), The Chemical Composition of Low Dielectric Constant Films From Novel Ion Scattering Methodologies, Journal of Applied Physics (Accessed April 16, 2024)
Created October 16, 2008