Boron Substrates for the X-Ray Microanalysis of Particles

Published

January 1, 1999

Author(s)

Eric S. Windsor, Dale E. Newbury, J Kessler

Abstract

Boron is available commercially as high purity (> 0.995) crystalline pieces. Using metallographic sample preparation techniques, these crystalline pieces can be prepared to form substrates that are useful for the x-ray microanalysis of particles. Boron is desirable as a substrate because its low atomic number will minimize interference with particle generated x-rays. Boron substrates are a non-toxic alternative to beryllium planchets. They are particularly useful for the analysis of carbon-containing particles. Metallographic sample preparation of boron substrates involves sectioning the crystalline pieces into thin slices, mounting the slices in epoxy and then grinding and polishing. Polished substrate surfaces are flat and smooth with RMS roughness values of less than 5 nm. Particles on these surfaces are easily observed and analyzed. Electron probe analysis of the polished boron substrates indicates that they retain their high purity during sample preparation with the introduction of only trace levels of contamination.

Citation

Microscopy and Microanalysis

Volume

5

Pub Type

Journals

Keywords

boron, carbonaceous particles, electron probe microanalyzer, low background, scanning electron microscope, substrates, x-ray microanalysis

Citation

Windsor, E. , Newbury, D. and Kessler, J. (1999), Boron Substrates for the X-Ray Microanalysis of Particles, Microscopy and Microanalysis (Accessed June 29, 2025)