Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Application of the Three Ω Method to a Film on a Substrate of Finite Thickness

Published

Author(s)

J Y. Kim, A Feldman, Donald B. Novotny

Abstract

The three omega thermal conductivity measurement method is analyzed for the case of one or more thin films on a substrate of finite thickness. The analysis is used to obtain the thermal conductivities of SiO2 films on Si substrates and of a chemical vapor deposition CVD diamond plate. For the case of the SiO2 films on a Si, we find an apparent thickness dependence of the thermal conductivity of the SiO2 films. However, the data can also be explained by a thickness-independent thermal conductivity and an interfacial thermal resistance. For the case of the CVD diamond plate, the fit of the theory to the experimental data is significantly improved if we assume that an interface layer separates the heater from the diamond plate.
Citation
Journal of Applied Physics
Volume
86
Issue
No. 7

Keywords

CVD, substrate, thermal conductivity, three omega method

Citation

Kim, J. , Feldman, A. and Novotny, D. (1999), Application of the Three Ω Method to a Film on a Substrate of Finite Thickness, Journal of Applied Physics (Accessed April 23, 2024)
Created October 1, 1999, Updated February 19, 2017