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Analysis of the YBa2Cu3O7/SiTiO3 Interface as a Function of Post-Deposition Annealing Temperature

Published

Author(s)

S. E. Asher, A. J. Nelson, A. R. Mason, A. B. Swartzlander, R. G. Dhere, L. L. Kasmerski, J. Halbritter, Todd E. Harvey, James A. Beall, Ronald H. Ono
Proceedings Title
AIP Conf. Proc., American Vacuum Society Fall Mtg.
Conference Dates
October 10-15, 2090
Conference Location
Boston, MA, USA

Citation

Asher, S. , Nelson, A. , Mason, A. , Swartzlander, A. , Dhere, R. , Kasmerski, L. , Halbritter, J. , Harvey, T. , Beall, J. and Ono, R. (1990), Analysis of the YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7</sub>/SiTiO<sub>3</sub> Interface as a Function of Post-Deposition Annealing Temperature, AIP Conf. Proc., American Vacuum Society Fall Mtg., Boston, MA, USA (Accessed April 20, 2024)
Created December 30, 1990, Updated October 12, 2021