Stan, G.
and Cook, R.
(2010),
Advanced Nanoscale Elastic Property Measurement by Contact-Resonance Atomic Force Microscopy, TechConnect World Conference and Expo 2010, Anaheim, CA
(Accessed December 1, 2024)
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Advanced Nanoscale Elastic Property Measurement by Contact-Resonance Atomic Force Microscopy
Published
Author(s)
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Abstract
In atomic force microscopy (AFM)-based techniques, material information (topography, mechanical, electrical, magnetic, etc.) is retrieved from the nanoscale interaction between the AFM tip and the material probed. As the size of the apex of the AFM tip is comparable with the size of the investigated structures, it is very important to recognize the tip contribution to the quantities measured. In particular, this is necessary when nanoscale elastic properties are probed by contact-resonance AFM (CR-AFM), in which case, the tip contribution needs to be considered in both the topographical and contact mechanical responses. By combining topography and mechanical response, an advanced characterization of non-flat nanoscale structures by CR-AFM has been accomplished. Two major applications will be discussed here: (1) self-correlation of the topography image and contact stiffness map for a granular Au film and (2) point measurements across oxidized Si nanowires.Volume
1
Conference Dates
June 21-25, 2010
Conference Location
Anaheim, CA
Conference Title
TechConnect World Conference and Expo 2010
Pub Type
Conferences
Keywords
nanoscale elastic modulus, contact resonance, atomic force microscopy, nanowires
Citation
Issues
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Created June 23, 2010, Updated February 19, 2017