Pressure & vacuum metrology

News and Updates

No Longer Under Pressure: NIST Dismantles Giant Mercury Manometer

June 28, 2019

Video by: Jennifer Lauren Lee/NIST. Animations: Sean Kelley/NIST. Music: Blue Dot Sessions. Photos: Bruce Johnson and Jay Hendricks/NIST For the last 30 years

FLOC Takes Flight: First Portable Prototype of Photonic Pressure Sensor

February 25, 2019

In collaboration with industry, researchers from the National Institute of Standards and Technology (NIST) have made the first portable prototype of the Fixed

A New Way to Measure Nearly Nothing

October 19, 2018

Many semiconductor fabricators and research labs are under increasing pressure from, of all things, vacuum. These facilities need to remove greater amounts of

Asia Robertson of NIST’s Fabrication Technology Office makes final adjustments on an encasement.

NIST Expertise Helps Protect Historical Documents at the National Museum of African American History and Culture

February 21, 2018

This month, two seminal documents in American history—the Emancipation Proclamation and the 13th Amendment to the Constitution—went on display at the

Publications

A single-beam slower and magneto-optical trap using a nanofabricated grating

June 11, 2019

Author(s)

Daniel S. Barker, Eric B. Norrgard, Nikolai N. Klimov, James A. Fedchak, Julia K. Scherschligt, Stephen P. Eckel

We demonstrate a compact (0.25 L) system for laser cooling and trapping atoms from a heated dispenser source. Our system uses a nano-fabricated diffraction

Elastic Rate Coefficients of Li+H2 collisions in the calibration of a Cold Atom Vacuum Sensor

April 29, 2019

Author(s)

Constantinos Makrides, Daniel S. Barker, Julia K. Scherschligt, Stephen P. Eckel, Eite Tiesinga

On going efforts at the National Institute of Standards and Technology in creating a Cold Atom Vacuum Sensor device have prompted theoretical investigations of

Measured relationship between thermodynamic pressure and refractivity for six candidate gases in laser barometry

April 15, 2019

Author(s)

Patrick F. Egan, Jack Stone, Julia K. Scherschligt, Allan H. Harvey

Laser refractometers are approaching accuracy levels where gas pressures in the range 1 Pa

Apparatus for Characterizing Gas-Phase Chemical Precursor Delivery for Thin Film Deposition Processes

March 26, 2019

Author(s)

James E. Maslar, William A. Kimes, Brent A. Sperling

Thin film vapor deposition processes, e.g., chemical vapor deposition, are widely utilized in high volume manufacturing of electronic and optoelectronic devices