Wet Chemistry
Our multi-bench wet chemistry tool set includes RCA clean baths, KOH etching, HF vapor etching, hot solvent spray lift-off, and critical point drying.
Spray Solvent Liftoff: Microprocess Technology Avenger |
| Heated spray solvent tool provides users with automatic metal lift-off processing. - Automatic recipe control
 - Reduced liftoff times versus manual processing
- Dry wafer in, dry wafer out process
- Reduced user solvent exposure
- Substrates from pieces to 150 mm wafers
- Quick change rotor system
Applications: - Metal liftoff
- Resist strip
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Heated Wet Chemical Bench: 6-ft |
| This bench is used to etch and clean samples. - 183 cm (72 in) Open Wet Bench.
 - Contains 2 dip tanks, two reflux quartz heated baths, glove rinse, DI and N2 spray guns, GFCI 120 VAC receptacle, and two safety eyewash stations.
- Capable of handling small samples up to a full cassette of 6" wafers.
- Tank 1: Dip tank with lid (Buffered Oxide Etch-BOE)
- Tank 2: Reflux heated bath (RCA Standard Clean 1-SC1)
- Tank 3: Dip Tank with lid (2% HF)
- Tank 4: Dump Rinse with lid
- Tank 5: Reflux heated bath (RCA Standard Clean 2-SC2)
- It is located in an ultra-clean CMOS-compatible area and is subject to strict restrictions to prevent cross contamination.
Applications: - This tool is used for the "RCA" cleaning of wafers to remove organic and metallic surface contaminants.
- BOE to etch silicon dioxides
Demonstrated use: Etching of patterned oxide; Contaminant removal; Wafer reclaim
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Heated Wet Chemical Bench: 8-ft |
| This bench is used to etch and clean samples. - 244 cm (96 in) Open Wet Bench.
 - Contains 4 dip tanks, 4 reflux quartz heated baths, glove rinse, DI and N2 spray guns, GFCI 120 VAC receptacle, and two safety eyewash stations.
- Capable of handling small samples up to a full cassette of 150 mm (6 in) wafers.
- Tank 1: Dip tank with lid (Buffered Oxide Etch-BOE).
- Tank 2: Reflux heated bath (RCA Standard Clean 1-SC1).
- Tank 3: Dip Tank with lid (2% HF).
- Tank 4: Dump Rinse with lid.
- Tank 5: Reflux heated bath (RCA Standard Clean 2-SC2).
- Tank 6 and 8: small volume dip tanks for 100 mm (4 in) wafer cassettes and samples.
- Tank 7 and 9: small volume quartz heated baths for 100 mm (4 in) wafers cassettes and samples.
Applications: - This tool is used for the "RCA" cleaning of wafers to remove organic and metallic surface contaminants.
- BOE to etch silicon dioxides
Demonstrated use: Demonstrated use: Etching of patterned oxide; Contaminant removal; Wafer reclaim
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Spin Rinse Dryers: Semitool PSC-101 |
| These two tools are used for the DI water rinsing and spin-drying of the wafers after RCA cleaning. - Cassettes for 75 mm, 100 mm, and 150 mm (3 in, 4 in, and 6 in) wafers
 - Programmable recipes for rinse, quality rinse, purge and two dry cycles
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KOH Wet Etch Bench: Reynoldstech
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Acid Etch Bench: Reynoldstech
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