Dale E. Newbury

Publications

Ti_(12.5)Zr_(21)V_(10)Cr_(8.5)Mn_(x)Co_(1.5)Ni_(46.5-x)AB_(2)-type metal hydride alloys for electrochemical storage application: Part 1. Structural characteristics

August 03, 2012

Author(s):

Leonid A. Bendersky, Ke Wang, Igor Levin, Dale E. Newbury, K. Young, B. Chao, Adam A. Creuziger

The microstructures of a series of AB_(2)-based metal hydride alloys (Ti_(12.5)Zr_(21)V_(10)Cr_(8.5)Mn_(x)Co_(1.5)Ni_(46.5-x)) designed to have different...

Compton Scattering Artifacts in Electron Excited X-ray Spectra Measured with a Silicon Drift Detector

December 01, 2011

Author(s):

Nicholas W. Ritchie, Dale E. Newbury, Abigail P. Lindstrom

Artifacts are the nemesis of trace element analysis in electron-excited energy dispersive x-ray spectrometry. Peaks which result from non-ideal behavior in the...

Bridging the Micro to Macro Gap: A New Application for Milli-probe X-ray Fluorescence

June 01, 2011

Author(s):

Jeffrey M. Davis, Dale E. Newbury, Nicholas W. Ritchie, Edward P. Vicenzi, Dale P. Bentz, Albert J. Fahey

X-ray elemental mapping and x-ray spectrum imaging are powerful microanalytical tools. However, their scope is limited spatially by the raster area of a...

Characterization of SiGe Films for use as a National Institute of Standards and Technology (NIST) Microanalysis Reference material (RM 8905)

February 01, 2010

Author(s):

Ryna B. Marinenko, Shirley Turner, David S. Simons, Savelas A. Rabb, Rolf L. Zeisler, Lee L. Yu, Dale E. Newbury, Rick L. Paul, Nicholas W. Ritchie, Stefan D. Leigh, Michael R. Winchester, Lee J. Richter, Douglas C. Meier, Keana C. Scott, D Klinedinst, John A. Small

Bulk SiGe wafers cut from single-crystal boules and two SiGe thick films (4 m and 5 m thick) on Si wafers were evaluated with the electron...

Mistakes Encountered During Automatic Peak Identification in Low Beam Energy X-Ray Microanalysis

April 01, 2007

Author(s):

Dale E. Newbury

Automated peak identification in electron beam excited x-ray microanalysis with energy dispersive x-ray spectrometry is subject to occasional mistakes even on...