The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation nanodevices. The purpose of the short course is to train the semiconductor industry on the NIST-developed Critical Dimension Small Angle X-ray Scattering (CDSAXS) method and to transfer technology to the equipment vendors. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. Expected attendees include semiconductor manufacturers, equipment manufacturers, and component manufacturers.