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X-ray Metrology for the Semiconductor Industry Workshop

The semiconductor industry is in need of new, in-line dimensional metrology methods with higher spatial resolution for characterizing their next generation nanodevices. The purpose of the short course is to train the semiconductor industry on the NIST-developed Critical Dimension Small Angle X-ray Scattering (CDSAXS) method and to transfer technology to the equipment vendors. The topics will include both data processing and instrumentation. The short course will also provide an opportunity for discussion of the requirements for CDSAXS and the necessary improvements in X-ray source technology. Expected attendees include semiconductor manufacturers, equipment manufacturers, and component manufacturers.


NIST/Materials Science and Engineering Division

Day one (lectures)

  • Diffraction theory
  • Instrumentation overview
  • Source, optic, and detector theory
  • Data processing theory
  • Data modeling theory

Day two (hands on)

  • Two rotating groups of 12 to 15 people
  • Data processing and modeling (0.5 day)
  • Instrumentation (0.5 day in our lab)

NIST is a secure facility. Please consult registration page for security information.

Created May 20, 2016, Updated September 21, 2016