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2015 nSoft Annual Meeting

The 2015 nSoft Consortium Annual Meeting will provide current and potential members of the nSoft consortium a venue to review current activities of the consortium, discuss new routes to achieve impact in manufacturing of soft materials, and provide members with a chance to view equipment and technology advances at the NIST Center for Neutron Research.

Sponsors

Materials Science and Engineering Division, MML, NIST

NIST Center for Neutron Research

NCNR (Building 235), Room K04B

 

8:50am - Welcome to NIST - Ron Jones, NIST

9:00am - Update on the NIST Center for Neutron Research - Dan Neumann, NIST

9:30am - Update on Materials Genome Initiative - Eric Lin, NIST

10:00am - Extending ideal neutron scattering models tocommercial polymers - Brian Habersberger, Dow Chemical

10:30am - Coffee Break/Posters

11:00am - Characterizing soft materials with neutrons at Solvay - Ryan Murphy, Solvay

11:30am - Progress in antibody characterization with neutrons - Jai Pathak, MedImmune

12:00pm - Lunch at NIST Cafeteria

1:15pm - Tour of the NCNR - Dan Neumann, NIST

1:45pm - Extracting new information from semicrystallinepolymers using vapor flow SANS - Paul DesLauriers, Chevron Phillips

2:15pm - Issues and progress in the characterization of shaleand natural gas deposits - Jinhong Chen, Aramco Services North America

2:45pm - Coffee Break/Poster Session

3:15pm - Characterization efforts for protein-basedtherapeutics using neutron scattering - Dan Zarraga, Genentech

3:45pm - Future directions of nSoft: High strain andPressurized Flow - Ron Jones, NIST

4:15pm - Open Discussion - Ron Jones, NIST

4:45pm - Wrap-up and End of Meeting - Ron Jones, NIST

A list of hotels nearby the NIST campus can be found at:

http://www.nist.gov/public_affairs/visitor/hotels.cfm

 

NON U.S. CITIZENS PLEASE NOTE:All foreign national visitors who do not have permanent resident status and who wish to register for the above meeting must supply additional information. Failure to provide this information prior to arrival will result, at a minimum, in significant delays (up to 24 hours) in entering the facility. Authority to gather this information is derived from United States Department of Commerce Department Administrative Order (DAO) number 207-12. When registration is open, the required NIST-1260 form will be available as well.

Created June 22, 2015, Updated September 21, 2016