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The ASML 275D I-line stepper, an advanced projection photolithography tool, has been serving NanoFab users for 2 years. Its high resolution and stability enabled numerous successful projects with critical precision requirements under the half-micron regime. This ASML stepper user seminar is designed for all levels of audiences who are interested in knowing the working principles of this sophisticated tool and the unique features it is equipped with for R&D.
Agenda:
- Introduction of Stepper - how a projection lithography tool works and how images are formed. 9:30 – 10:00
- Front side TTL Alignment 10:00 - 10:30
- User projects 10:30 – 11:00
- Michael Carrier (Bioprocess measurements group) - SU8 application
- William Osborn (Nanomechanical Properties Group) - Handling of piece sample and backside alignment in stepper
- Break 11:00 – 11:15
- Multiple Step Imaging System 11:15 – 11:35
- 3D (backside) Alignment 11:35 – 12:00
- Q & A after lunch if needed
Sponsors
Fred Hafner
ASML Senior Application Engineer