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NanoFab Tool: Jeio Tech OF-12G Forced Convection Oven


The Jeio Tech OF-12G forced convection oven is used in the soft lithography processing to perform a dehydration bake prior to silanization and cure samples coated with elastomeric polymers. It has two internal shelves to accommodate multiple samples for curing substrates ranging from 200 mm wafers down to small pieces.


  • Type: Forced convection oven.
  • Min temperature: 30 °C.
  • Max temperature: 250 °C.
  • Volume: 102 L.
  • Temperature fluctuation at 100 °C: ±0.6 °C.
  • Temperature variation at 100 °C: ±1.3 °C.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: Yes.

Typical Applications

  • Dehydration.
  • Polymer curing.
Created February 11, 2015, Updated November 21, 2019