| Author(s): |
Martin Foldyna; Thomas A. Germer; Brent Bergner; |
| Title: |
Effects of Roughness on Scatterometry Signatures |
| Published: |
May 26, 2011 |
| Abstract: |
We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 µm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER. |
| Proceedings: |
Frontiers of Characterization and Metrology for Nanoelectronics 2011 |
| Volume: |
1395 |
| Pages: |
pp. 49 - 53 |
| Location: |
Grenoble, -1 |
| Dates: |
May 24-26, 2011 |
| Keywords: |
Diffraction grating; Ellipsometry; Line edge roughness; Mueller matrix; Multi-azimuth method |
| Research Areas: |
Optical Metrology, Optics, Length |
| PDF version: |
 Click here to retrieve PDF version of paper (482KB) |
