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|Author(s):||Martin Foldyna; Thomas A. Germer; Brent Bergner;|
|Title:||Effects of Roughness on Scatterometry Signatures|
|Published:||May 26, 2011|
|Abstract:||We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 µm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.|
|Proceedings:||Frontiers of Characterization and Metrology for Nanoelectronics 2011|
|Pages:||pp. 49 - 53|
|Dates:||May 24-26, 2011|
|Keywords:||Diffraction grating, Ellipsometry, Line edge roughness, Mueller matrix, Multi-azimuth method|
|Research Areas:||Optical Metrology, Optics, Length|
|PDF version:||Click here to retrieve PDF version of paper (493KB)|