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Publication Citation: Effects of Roughness on Scatterometry Signatures

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Author(s): Martin Foldyna; Thomas A. Germer; Brent Bergner;
Title: Effects of Roughness on Scatterometry Signatures
Published: May 26, 2011
Abstract: We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 µm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.
Proceedings: Frontiers of Characterization and Metrology for Nanoelectronics 2011
Volume: 1395
Pages: pp. 49 - 53
Location: Grenoble, -1
Dates: May 24-26, 2011
Keywords: Diffraction grating; Ellipsometry; Line edge roughness; Mueller matrix; Multi-azimuth method
Research Areas: Optical Metrology, Optics, Length
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