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Publication Citation: Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods

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Author(s): John S. Villarrubia; Ronald G. Dixson; Samuel N. Jones; J R. Lowney; Michael T. Postek;
Title: Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods
Published: January 01, 2000
Abstract: Abstract unavailable.
Citation: Transfer Document; NIST/SEMATECH Proprietary
Keywords: atomic force microscopy (AFM),critical dimension (CD),electrical critical dimension (ECD),linewidth metrology,scanning electron microscopy (SEM)
Research Areas: Manufacturing, Metrology