| Author(s): |
John S. Villarrubia; Ronald G. Dixson; Samuel N. Jones; J R. Lowney; Michael T. Postek; |
| Title: |
Final Report: 1998-1999 NIST/SEMATECH Project on Intercomparison of Linewidth Measurement Methods |
| Published: |
January 01, 2000 |
| Abstract: |
Abstract unavailable. |
| Citation: |
Transfer Document; NIST/SEMATECH Proprietary |
| Keywords: |
atomic force microscopy (AFM);critical dimension (CD);electrical critical dimension (ECD);linewidth metrology;scanning electron microscopy (SEM) |
| Research Areas: |
Metrology, Manufacturing |
