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Publication Citation: Interim Report, NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing

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Author(s): Michael T. Postek;
Title: Interim Report, NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Published: October 31, 1997
Abstract: Unavailable.
Citation: NIST/SEMATECH Proprietary Document
Pages: pp. 1 - 25
Research Areas: Manufacturing, Metrology