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971. Characterization of On-Wafer Diode Noise Sources
Topic: Manufacturing
Published: 6/1/1998
Authors: James Paul Randa, David K Walker, Lawrence P. Dunleavy, Robert L Billinger, Joseph Paul Rice
Abstract: A set of wafer probeable diode noise source transfer standards are characterized using on-wafer noise temperature methods developed recently at the National Institute of Standards and Technology (NIST). This paper reviews the methods for accurate on ...

972. Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line
Topic: Manufacturing
Published: 6/1/1998
Authors: Richard M Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S Villarrubia, E Clayton Teague
Abstract: We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlle ...

973. Measurement of Pitch and Width Samples with the NIST Calibrated Atomic Force Microscope
Topic: Manufacturing
Published: 6/1/1998
Authors: Ronald G Dixson, R Koning, Theodore Vincent Vorburger, Joseph Fu, V W. Tsai
Abstract: Because atomic force microscopes (AFMs) are capable of generating three dimensional images with nanometer level resolution, these instruments are being increasingly used in many industries as tools for dimensional metrology at sub- micrometer length ...

974. Strategy for Faster Blind Reconstruction of Tip Geometry for Scanned Probe Microscopy
Topic: Manufacturing
Published: 6/1/1998
Author: John S Villarrubia
Abstract: In scanned probe microscopy, it is necessary to know the tip's geometry in order to correct image distortions due to its finite size. Heretofore, methods have focused upon determining the tip shape by erosion of a tip characterizer of known geometry ...

975. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Topic: Manufacturing
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...

976. Inverse Electron Beam Modeling and Metrology Research
Topic: Manufacturing
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery

977. Simulation and Measurement of Subsurface Features in Scanning Electron Microscopy Metrology
Topic: Manufacturing
Published: 4/1/1998
Authors: J R. Lowney, Michael T Postek, Samuel N Jones, S Mayo, Michael W Cresswell

978. Summary Report of NIST/MSC Workshop on Traceability in Length
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6149
Topic: Manufacturing
Published: 4/1/1998
Author: Dennis A Swyt
Abstract: The National Institute of Standards and Technology, in conjunction with the Measurement Science Conference, conducted an industry-needs workshop on February 4, 1998, on issues with U.S. manufacturing companies, particularly smaller ones, may have in ...

979. The Estimation of Measurement Uncertainty of Small Circular Features Measured by Coordinate Measuring Machines
Topic: Manufacturing
Published: 4/1/1998
Authors: Steven David Phillips, Bruce R. Borchardt, William Tyler Estler, J Buttress
Abstract: This paper examines the measurement uncertainty of small circular features as a function of the sampling strategy; i.e., the number and distribution of measurement points. Specifically, we examine measuring a circular feature using a three-point samp ...

980. Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing
Topic: Manufacturing
Published: 3/30/1998
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critic ...

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