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971. Improved Photomask Metrology Through Exposure Emulation
Topic: Manufacturing
Published: 7/1/1995
Author: James Edward Potzick
Abstract: The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial image in the wafer stepper, some are properties of the stepper projection system and some ar ...

972. In Situ Testing and Calibrating of Z-Piezo of an Atomic Force Microscope
Topic: Manufacturing
Published: 7/1/1995
Author: Joseph Fu
Abstract: By scanning a slightly tilted, smooth surface with an atomic force microscope (AFM), it is possible to obtain hysteresis loops which contain information on the nonlinearity and hysteresis in the z axis of the AFM''s piezoelectric actuator. A 15% vari ...

973. Scanned Probe Techniques for the Electrical Characterization of Semiconductor Devices
Topic: Manufacturing
Published: 7/1/1995
Authors: John A Dagata, Joseph J Kopanski
Abstract: The spatial resolution, sensitivity, and accuracy required for electrical characterization of device structures in the semiconductor industry suggest that scanned probe microscopy (SPM) tools may offer an alternative to existing measurement technique ...

974. NIST SRM 9983 High Rigidity Ball-Bar Stand User Manual
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5659
Topic: Manufacturing
Published: 6/1/1995
Authors: Daniel S Sawyer, Steven David Phillips, Gregory W Caskey, Bruce R. Borchardt, David E Ward, P Snoots
Abstract: This document is the user manual for the NIST SRM 9983 High Rigidity Ball Bar Stand. The manual contains a list of the components that are included as part of the unit. Complete instructions for setting up and assembling the stand to support a ball b ...

975. The Gage Block Handbook
Series: Monograph (NIST MN)
Report Number: 180
Topic: Manufacturing
Published: 6/1/1995
Authors: Theodore D Doiron, John S Beers
Abstract: Gage blocks are the primary method used by industry to standardize the measurement of dimension. This work discusses every aspect of gage block calibration, including definitions, characteristics of gage blocks, calibration by interferometry and mech ...

976. Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM
Topic: Manufacturing
Published: 5/22/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating vo ...

977. Delineation of pn Junctions by Scanning Tunneling Microscopy/Spectroscopy in Air and Ultrahigh Vacuum
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, John A Dagata, H. W. Tseng
Abstract: Lateral dopant profiling of cleaved, passivated abrupt GaAs pn junctions using scanning tunneling microscopy/spectroscopy is demonstrated both in ultrahigh vacuum and air. A combination of forward-and reverse-bias imaging and position-dependent tunn ...

978. Metrology with the Ultraviolet Scanning Transmission Microscope
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Y Hu
Abstract: A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommod ...

979. Overlay Measurements and Standards
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Robert D. Larrabee
Abstract: The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In respon ...

980. Progress on Accurate Metrology of Pitch, Height, Roughness, and Width Artifacts Using an Atomic Force Microscope
Topic: Manufacturing
Published: 5/1/1995
Authors: J Schneir, T Mcwaid, Ronald G Dixson, V W. Tsai, John S Villarrubia, Edwin Ross Williams, E Fu
Abstract: NIST personnel visited 23 IC manufacturing companies and equipment suppliers during 1994 to determine semiconductor industry needs for scanned probe metrology. NIST has initiated projects addressing some of the needs identified. When complete, these ...

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