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Displaying records 971 to 980 of 1000 records.
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971. Delineation of pn Junctions by Scanning Tunneling Microscopy/Spectroscopy in Air and Ultrahigh Vacuum
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, John A Dagata, H. W. Tseng
Abstract: Lateral dopant profiling of cleaved, passivated abrupt GaAs pn junctions using scanning tunneling microscopy/spectroscopy is demonstrated both in ultrahigh vacuum and air. A combination of forward-and reverse-bias imaging and position-dependent tunn ...

972. Metrology with the Ultraviolet Scanning Transmission Microscope
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Y Hu
Abstract: A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommod ...

973. Overlay Measurements and Standards
Topic: Manufacturing
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Robert D. Larrabee
Abstract: The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In respon ...

974. Progress on Accurate Metrology of Pitch, Height, Roughness, and Width Artifacts Using an Atomic Force Microscope
Topic: Manufacturing
Published: 5/1/1995
Authors: J Schneir, T Mcwaid, Ronald G Dixson, V W. Tsai, John S Villarrubia, Edwin Ross Williams, E Fu
Abstract: NIST personnel visited 23 IC manufacturing companies and equipment suppliers during 1994 to determine semiconductor industry needs for scanned probe metrology. NIST has initiated projects addressing some of the needs identified. When complete, these ...

975. Re-Evaluation of the Accuracy of NIST Photomask Linewidth Standards
Topic: Manufacturing
Published: 5/1/1995
Author: James Edward Potzick
Abstract: Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This uncertainty is caused by a combination of those factors which influence the calibration measur ...

976. Light Scattered by Sinusoidal Surfaces: Illumination Windows and Harmonics in Standards
Topic: Manufacturing
Published: 3/1/1995
Authors: Egon Marx, T Lettieri, Theodore Vincent Vorburger
Abstract: Sinusoidal surfaces can be used as material standards to help calibrate instruments that measure the angular distribution of the intensity of light scattered by arbitrary surfaces, because the power in the diffraction peaks varies over several orders ...

977. A Method for the Spatial Calibration of a Commercial Phase Measuring Interferometer
Topic: Manufacturing
Published: 2/1/1995
Authors: P Sullivan, Christopher J. Evans
Abstract: In a phase measuring interferometer (PMI), the interference pattern is focused on a charge coupled device (CCD) detector array and data points are sampled at the corresponding locations. In most commercially available systems, a zoom lens forms part ...

978. Microform Calibrations in Surface Metrology
Topic: Manufacturing
Published: 2/1/1995
Authors: Jun-Feng Song, F Rudder, Theodore Vincent Vorburger, A Hartman, Brian R Scace, J Smith
Abstract: Microform calibrations include the measurement of complex profile forms and position errors of micrometer scale in combination with the measurement of deviations from a specified profile and surface texture of profile segments. Tolerances on the prof ...

979. The Estimation of Measurement Uncertainty of Small Circular Features Measured by CMMs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5698
Topic: Manufacturing
Published: 2/1/1995
Authors: Steven David Phillips, Bruce R. Borchardt, William Tyler Estler
Abstract: This paper examines the measurement uncertainty of small circular features as a function of the sampling strategy, i.e., the number and distribution of measurement points. Specifically, we examine measuring a circular feature using a three-point samp ...

980. User Manual for the Interim Testing Artifact for CMMs
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5602
Topic: Manufacturing
Published: 2/1/1995
Authors: Amy Singer, J Land, Steven David Phillips, Daniel S Sawyer, Bruce R. Borchardt, Gregory W Caskey, et al
Abstract: The Interim Testing Artifact (ITA) is designed to quickly test CMMs for performance problems so that they can be repaired before significant numbers of good parts are erroneously rejected (or bad parts accepted) by the CMM. Frequent testing using the ...

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